Fabrication and ultraviolet photoresponse characteristics of ordered SnOx (x ≈ 0.87, 1.45, 2) nanopore films
نویسندگان
چکیده
Based on the porous anodic aluminum oxide templates, ordered SnOx nanopore films (approximately 150 nm thickness) with different x (x ≈ 0.87, 1.45, 2) have been successfully fabricated by direct current magnetron sputtering and oxidizing annealing. Due to the high specific surface area, this ordered nanopore films exhibit a great improvement in recovery time compared to thin films for ultraviolet (UV) detection. Especially, the ordered SnOx nanopore films with lower x reveal higher UV light sensitivity and shorter current recovery time, which was explained by the higher concentration of the oxygen vacancies in this SnOx films. This work presents a potential candidate material for UV light detector.PACS: 81.15.Cd, 81.40.Ef, 81.70.Jb, 85.60.Gz.
منابع مشابه
Fabrication and centeracterization of ordered CuIn(1−x)GaxSe2 nanopore films via template-based electrodeposition
Ordered CuIn(1-x)GaxSe2 (CIGS) nanopore films were prepared by one-step electrodeposition based on porous anodized aluminum oxide templates. The as-grown film shows a highly ordered morphology that reproduces the surface pattern of the substrate. Raman spectroscopy and X-ray diffraction pattern show that CIGS nanopore films had ideal chalcopyrite crystallization. Energy dispersive spectroscopy ...
متن کاملFabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique
Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, X-ray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectrosc...
متن کاملMorphological, structural and photoresponse characterization of ZnO nanostructure films deposited on plasma etched silicon substrates
ZnO nanostructure films were deposited by radio frequency (RF) magnetron sputtering on etched silicon (100) substrates using dry Ar/SF6 plasma, at two etching times of 5 min and 30 min, and on non etched silicon surface. Energy dispersive X-ray (EDX) technique was employed to investigate the elements contents for etched substrates as well as ZnO films, where it is found to be stoichiometric. Su...
متن کاملIn situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques
The atomic layer deposition sALDd of tin oxide thin films has been examined using in situ quartz crystal microbalance sQCMd and Fourier transform infrared sFTIRd techniques. The SnOx films were deposited using sequential exposures of SnCl4 and H2O2 at temperatures from 150 to 430 °C. The linear growth of the tin oxide ALD films was observed by both the mass gain during QCM measurements and the ...
متن کاملFabrication of an alpha particle counter: spin coated films of synthesized nanocrystalline cadmium tungstate powder
Background: CdWO4 is a scintillator with some unique properties. For example, high density, thermal and chemical stability and so on. Different applications of this scintillator such as X-ray scintillator has been investigated thoroughly so far. However, there is limited number of studies reporting the characteristics of CdWO4 as an alpha counter. Materials and Methods: The CdWO4 powder was syn...
متن کامل